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Facilities

Experimental Cluster for Surface and Interface Science

MBE

The Cluster represents one of the most complex such systems in Europe, makes possible the

preparation and characterization in situ of surfaces and interfaces, and consists of three mutually coupled units:

- The MBE (Molecular Beam Epitaxy) Chamber;

- The STM (Scanning Tunneling Microscope) Chamber;

- The Spin- and Angle-resolved Photoelectron Spectroscopy (SARPES).

All chambers operate in ultrahigh vacuum (UHV), the base pressure ranges from 1-2 x 10-10 mbar to 10-11 mbar range The overall value of the whole system exceeds 1.3 M€. The employed techniques are:

Contact person: Dr. Cristian-Mihail Teodorescu  ...e-mail...

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Ntegra Aura Scanning Probe Microscopy (SPM) Station

STM1

Available techniques:

1. Atomic Force Microscopy (AFM)

2. Double-pass techniques

3. Scanning Tunneling Microscopy (STM) mode

4. Nanoindentation.

Contact person: Dr. Cristian-Mihail Teodorescu  ...e-mail...

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 Magnetron sputtering deposition equipment with in situ ellipsometry monitoring of profile and thickness, and Auger, LEED surface characterization facilities

sputtering

 (1) – deposition chamber (four DC and RF magnetrons);

(2) & (2‘) – UV-VIS-NIR ellipsometer ((2) – in situ monitoring and (2’)- ex situ characterization);

(3) – Auger and LEED facilities;

(4) – Step profiler

Contact person: Dr. Magdalena Lidia Ciurea  ...e-mail...

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MULTIMETHOD SURFACE ANALYSIS SYSTEM FOR XPS, AES AND STM

XPS1

CHARACTERIZATION METHODS

 

X-ray Photoelectron Spectroscopy (XPS) - a spectroscopic technique based on photoelectric effect that measures the elemental composition, valence state and electronic state of the elements that exit within a material

 

Auger Electron Spectroscopy (AES) - an analytical technique based on Auger effect used for chemical characterization of surfaces and bulk materials

 

Scanning Tunneling Microscopy (STM) - a characterization technique based on quantum tunneling effect used for surface imaging at atomic resolution

Contact person: Dr. Cristian-Mihail Teodorescu  ...e-mail...

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 Set-up for electrical, photoelectrical, Hall effect and magnetoresistance characterizations of semiconductor nanostructured materials

electromagnetice

Contact person: Dr. Magdalena Lidia Ciurea  ...e-mail...

 Acurate measurements are performed:

- (photo)current – voltage characteristics at different temperatures (10-500K);

- current – temperature characteristics at different voltages ( -1000 +1000V);

- spectral dependence of photocurrent;

- capacitance – voltage characteristics;

- Hall measurements at different magnetic fields and temperatures (4 – 300K);

- current–voltage characteristics at different magnetic fields and temperatures (4–300K);

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The PEEM (Photoemission Electron Microscopy) and LEEM (Low Energy Electron Microscopy) system.

LEEM_PEEM

The setup operates in ultrahigh vacuum (below 2 x 10-10 mbar).

Methods available:

- Low energy electron microscopy (LEEM) in bright and dark field with a lateral resolution of 4 nm;

- Photoemission electron microscopy (PEEM) with two UV excitation sources (Hg lamp and He I - He II lamp), lateral resolution about 15 nm;

- Mirror electron microscopy (MEM);

- Micro-Low energy electron diffraction (Micro-LEED);

- k-space mapping with sub-micron lateral resolution (individual grains).

- recording LEEM, PEEM, MEM, LEED movies in real time during thermal treatments, ion sputtering or thin layer growth.

Contact person: Dr. Cristian-Mihail Teodorescu  ...e-mail...

More details......

Updated: 31 ian 2012 - Ionel Stavarache: stavarache@infim.ro